Sunpump

High stability pulsed laser

Model:eMOPA系列
High stability pulsed laser
High stability pulsed laser
High stability pulsed laser
High stability pulsed laser

Overview

E-mopa laser system is a compact laser amplified by microchip seed source with ultrashort pulse width, P to p peak power stability and high beam quality. Compared with most lasers in the market, it has unique performance parameters, especially suitable for high-precision laser micromachining, laser engraving, life science, material analysis, chemical testing and other application fields.

Description

E-mopa laser system is a compact laser amplified by microchip seed source with ultrashort pulse width, P to p peak power stability and high beam quality. Compared with most lasers in the market, it has unique performance parameters, especially suitable for high-precision laser micromachining, laser engraving, life science, material analysis, chemical testing and other application fields.

Specifications

wavelength532nm、355nm、266nm
pulse energy200uJ@1000Hz、80uJ@1000Hz、40uJ@1000Hz
repetition frequency1-1000Hz

Technical Data

型号 eMOPA 532-200 eMOPA 355-100 eMOPA 266-40
波长 532nm 355nm 266nm
脉冲能量 200uJ@1000Hz 80uJ@1000Hz 40uJ@1000Hz
峰值功率 130kw@1000Hz
100kw@1000Hz
40kw@1000Hz
重复频率 1-1000Hz 1-1000Hz 1-1000Hz
脉冲时间(FWHM) 1.5ns <1.3ns <1.0ns
偏振 >100:1 垂直  >100:1 垂直 
能量稳定性(6H) <± 3 % <± 3% <± 3%
光斑不圆度 < 2:1
发散角 <4.0mrad <3.5mrad <1.5mrad
接口 RS 232, USB, TTL控制和 功率监测 
外部触发 1 Hz -最大 重复频率 (TTL, 上升边缘)
可选项 •独立系统 (包括钥匙开关, 散热器, 快门; 符合CDRH要求)
•同步信号输出 (上升时间 < 2 ns)
•多模光纤耦合
•手动或电动快门